AMAT Applied Materials 5000-158控制器 PDF资料
1.产 品 资 料 介 绍:
AMAT Applied Materials 5000-158 控制器
产品概述
5000-158 是 AMAT 半导体工艺设备中的 控制器模块(Controller),主要用于对工艺过程中的关键子系统进行监控与管理。它作为设备的核心电子控制单元之一,承担信号采集、逻辑运算、执行指令下发的功能,确保沉积、刻蚀、清洗等工艺稳定进行。
技术功能与特点
系统监控与逻辑运算
采集来自气体面板、真空系统、温度传感器、射频电源等子系统的数据。
执行逻辑运算和工艺控制算法,并向执行部件下达控制指令。
多通道控制能力
可同时管理多个气路、加热器、真空阀或电源模块。
支持复杂工艺配方的切换与运行。
互锁与安全保护
内置互锁逻辑,当检测到腔体门未关闭、真空不足、温度过高等异常时,立即停止相关动作。
提供硬件级快速保护响应,降低工艺风险。
通信与接口
与上位主控计算机或 PLC 系统进行通信,上传工艺状态数据。
提供标准化接口,与 AMAT 其他控制卡、I/O 板卡兼容。
模块化设计
设计为可替换式模块,便于现场快速维护和更换。
支持设备升级和功能扩展。
应用领域
CVD(化学气相沉积)设备
控制气体流量、加热系统和反应腔条件,确保沉积工艺稳定。
PVD(物理气相沉积)设备
管理溅射电源、气体输入、真空系统,保证镀膜一致性。
刻蚀设备
执行气体混合、射频电源调节和工艺互锁保护,确保刻蚀精度。
清洗与表面处理设备
控制等离子体源、气体比例和温度,加快清洗效率。
晶圆传输与负载锁 (Loadlock)
管理传输机械臂、真空泵和舱门操作,保证晶圆搬运安全。
AMAT Applied Materials 5000-158控制器 英文资料:
AMAT Applied Materials 5000-158 Controller
Product Overview
5000-158 is a controller module in AMAT semiconductor process equipment, mainly used for monitoring and managing key subsystems in the process. As one of the core electronic control units of the device, it undertakes the functions of signal acquisition, logical operation, and instruction execution, ensuring stable processes such as deposition, etching, and cleaning.
Technical functions and features
System monitoring and logical operations
Collect data from subsystems such as gas panels, vacuum systems, temperature sensors, and RF power supplies.
Execute logical operations and process control algorithms, and issue control instructions to executing components.
Multi channel control capability
Can manage multiple gas paths, heaters, vacuum valves, or power modules simultaneously.
Support the switching and operation of complex process formulas.
Interlocking and Security Protection
Built in interlock logic, when detecting abnormalities such as the chamber door not being closed, insufficient vacuum, high temperature, etc., the relevant actions will be immediately stopped.
Provide hardware level fast protection response and reduce process risks.
Communication and Interface
Communicate with the upper control computer or PLC system to upload process status data.
Provide standardized interfaces that are compatible with other AMAT control cards and I/O boards.
modular design
Designed as replaceable modules for quick on-site maintenance and replacement.
Support device upgrades and feature extensions.
Application field
CVD (Chemical Vapor Deposition) equipment
Control gas flow rate, heating system, and reaction chamber conditions to ensure stable deposition process.
PVD (Physical Vapor Deposition) equipment
Manage sputtering power supply, gas input, and vacuum system to ensure coating consistency.
Etching equipment
Perform gas mixing, RF power regulation, and process interlock protection to ensure etching accuracy.
Cleaning and surface treatment equipment
Control the plasma source, gas ratio, and temperature to accelerate cleaning efficiency.
Wafer Transfer and Load Lock
Manage the operation of transfer robotic arms, vacuum pumps, and hatch doors to ensure safe wafer handling.
AMAT Applied Materials 5000-158控制器 产品展示
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