AMAT Applied Materials 0190-39331 控制器模块 PDF资料
1.产 品 资 料 介 绍：
产品概述
AMAT 0190-39331 控制器模块是半导体制造设备中的核心控制部件，用于管理工艺中各类执行器和传感器的操作信号。该模块能够协调气体、液体及运动控制系统，保证设备在各个工艺步骤中的精确性和稳定性。
产品应用领域
化学气相沉积（CVD）系统
控制反应气体流量和腔体压力，保证薄膜沉积的均匀性和工艺重复性。
协调加热、冷却和气体切换，实现高质量薄膜制备。
物理气相沉积（PVD）系统
管理金属靶材沉积过程中的气体流量和真空压力。
支持多腔体和多工艺同时控制，提高生产效率。
化学机械抛光（CMP）系统
控制抛光液及辅助液体的流量与压力，保证晶圆表面平坦化精度。
协调液体泵和阀门，实现动态流量调节，优化工艺效果。
刻蚀（Etch）系统
精确控制刻蚀气体流量、腔体压力和温度。
与主控系统和真空泵协调，实现高选择性和精度刻蚀。
离子注入（Ion Implantation）系统
调节气体流量和压力，确保离子束均匀性。
监控和反馈控制设备各模块，保证注入剂量和深度稳定。
其他半导体工艺系统
适用于多种精密流体控制和自动化控制系统。
可与温控模块、接口模块及伺服驱动器等配合使用，实现完整的工艺控制解决方案。
产品优势
精确控制：支持高精度的流量、压力及温度控制，保证工艺一致性。
多系统兼容：适用于 CVD、PVD、CMP、Etch、离子注入等多种半导体制造设备。
系统集成性强：可与 AMAT 其他控制模块、接口模块、传感器及驱动器无缝配合。
高可靠性：专为半导体工艺环境设计，抗干扰能力强，长期运行稳定。
可扩展性：支持多通道、多工艺控制，满足复杂生产需求。
AMAT Applied Materials 0190-39331 控制器模块 英文资料：
Product Overview
The AMAT 0190-39331 controller module is a core control component in semiconductor manufacturing equipment, used to manage the operation signals of various actuators and sensors in the process. This module can coordinate gas, liquid, and motion control systems to ensure the accuracy and stability of equipment in various process steps.
Product application areas
Chemical Vapor Deposition (CVD) System
Control the flow rate of reaction gas and chamber pressure to ensure the uniformity of thin film deposition and process repeatability.
Coordinate heating, cooling, and gas switching to achieve high-quality thin film preparation.
Physical Vapor Deposition (PVD) System
Manage the gas flow rate and vacuum pressure during the deposition process of metal target materials.
Support simultaneous control of multiple chambers and processes to improve production efficiency.
Chemical Mechanical Polishing (CMP) System
Control the flow rate and pressure of polishing solution and auxiliary liquid to ensure the accuracy of wafer surface planarization.
Coordinate liquid pumps and valves to achieve dynamic flow regulation and optimize process efficiency.
Etch system
Accurately control the flow rate of etching gas, chamber pressure, and temperature.
Coordinate with the main control system and vacuum pump to achieve high selectivity and precision etching.
Ion implantation system
Adjust gas flow rate and pressure to ensure ion beam uniformity.
Monitor and feedback control equipment modules to ensure stable injection dose and depth.
Other semiconductor process systems
Suitable for various precision fluid control and automation control systems.
It can be used in conjunction with temperature control modules, interface modules, and servo drives to achieve a complete process control solution.
Product advantages
Precise control: Supports high-precision flow, pressure, and temperature control to ensure process consistency.
Multi system compatibility: suitable for various semiconductor manufacturing equipment such as CVD, PVD, CMP, Etch, ion implantation, etc.
Strong system integration: can seamlessly integrate with other control modules, interface modules, sensors, and drivers of AMAT.
High reliability: designed specifically for semiconductor process environments, with strong anti-interference ability and stable long-term operation.
Scalability: Supports multi-channel and multi process control to meet complex production needs.
AMAT Applied Materials 0190-39331 控制器模块 产品展示
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| SC725B00101 | AMAT 0100-71121 | PFEA111-20 |
| SC725A-001-PM72016 | AMAT 00100-94015 | PFEA 113-65.2PXV |
| SC725A-001-PM72012 | AMAT 0100-01938 | 48980001-AP DSSB146 ABB |
| SC725A-001-PM72008 | AMAT 0100-00010 | PFEA111-65 |
| SC725A-001-01 | AMAT 0100-00052 | PFCL 201C-10.0KN |
| SC725A-001 | AMAT 0100-90952 | 57120001-CV DSTA131 ABB |
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