Gasonics AWD-D-1-0-023-010等离子电源模块 PDF资料
1.产 品 资 料 介 绍：
产品名称：Gasonics AWD-D-1-0-023-010 等离子电源模块
部件类型：射频电源模块（RF Plasma Power Supply Module）
主要功能：为等离子体处理设备提供射频（RF）能量，用于生成并维持工艺腔体内的等离子状态
一、等离子体激励核心组件
该模块为等离子灰化（plasma ashing）或刻蚀（etching）过程提供高频射频功率，激励腔体内的工艺气体（如 O₂、CF₄）形成等离子体，用于去除光刻胶或表面处理。
关键参数特征（典型值，需现场确认）：
射频功率范围：约 0–600W（具体取决于匹配腔体与气体种类）
输出频率：通常为 13.56 MHz 工业标准
工作模式：连续波（CW）或脉冲（Pulsed RF）
冷却方式：风冷或强制风道冷却
二、用于关键等离子处理工艺环节
Gasonics AWD-D-1-0-023-010 广泛应用于半导体制造设备中的以下处理流程：
应用工艺包括：
去胶（Photoresist Ashing）：利用 O₂ 等离子体清除晶圆表面的残胶
表面处理：提高附着性、清除污染物
轻度刻蚀：进行低速率材料去除处理（如表层蚀刻）
三、与整机系统的电气集成
该模块一般集成在主设备电气机柜内，通过接口与主控系统、匹配网络、电流/反射功率监控模块相连。
典型连接关系：
接收主控系统的启动/功率设定命令（模拟量或数字控制）
与射频匹配网络模块联动，自动调谐以降低反射功率
将实际功率、反射功率、报警状态返回给系统监控软件
英文资料：
Product Name: Gasonics AWD-D-1-0-023-010 Plasma Power Supply Module
Component type: RF Plasma Power Supply Module
Main function: Provide radio frequency (RF) energy for plasma processing equipment to generate and maintain the plasma state inside the process chamber
1、 Plasma excitation core components
This module provides high-frequency RF power for plasma ashing or etching processes, exciting process gases (such as O ₂, CF ₄) inside the cavity to form plasma for removing photoresist or surface treatment.
Key parameter characteristics (typical values, to be confirmed on-site):
RF power range: approximately 0-600W (depending on the matching cavity and gas type)
Output frequency: typically 13.56 MHz according to industry standards
Working mode: Continuous Wave (CW) or Pulsed RF
Cooling method: air cooling or forced air duct cooling
2、 Used for critical plasma treatment processes
Gasonics AWD-D-1-0-023-010 is widely used in the following processing flows in semiconductor manufacturing equipment:
The application process includes:
Photoresist Ashing: Using O ₂ plasma to remove residual adhesive from the wafer surface
Surface treatment: improve adhesion, remove pollutants
Mild etching: performing low rate material removal treatment (such as surface etching)
3、 Electrical integration with the entire system
This module is generally integrated into the main equipment electrical cabinet and connected to the main control system, matching network, and current/reflected power monitoring module through interfaces.
Typical Connection Relationship:
Receive startup/power setting commands (analog or digital control) from the main control system
Linked with the RF matching network module, automatically tuned to reduce reflected power
Return the actual power, reflected power, and alarm status to the system monitoring software
2.产 品 展 示
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