Tokyo Electron 3397-220047-2X冷水机组件 PDF资料
1.产 品 资 料 介 绍：
中文资料：
Tokyo Electron 3397-220047-2X 冷水机组件（Chiller Unit） 是一款专用于 TEL 半导体制造设备的热管理子系统，主要用于控制工艺设备中关键部件的温度，确保其在高精度、高稳定性的环境下运行。该组件通常集成于蚀刻、沉积、光刻等高真空、高温工艺平台中。
一、产品功能概述
设备类型：冷水机组件（液冷循环单元）
主要功能：
为设备提供稳定的冷却液温度；
调节腔体、加热板、RF电源或激光光源的运行温度；
与主控制系统联动，实现动态温控与异常报警。
二、核心应用领域
1. 等离子蚀刻设备（Plasma Etcher）
冷却反应腔、基板平台和 RF 匹配网络；
降低腔体壁面温度，抑制粒子生成，提高蚀刻均匀性与良率。
2. CVD/ALD 沉积设备
控制沉积腔体、基板、管道等的热管理系统；
防止材料结晶或不均匀沉积，提升膜厚一致性。
3. 光刻系统（Photolithography）
稳定光源模块（如激光、LED）的运行温度；
支持曝光平台、镜头组件的热补偿和散热。
4. 显影/清洗设备
控制化学液体（如显影剂、去胶液）或清洗腔体温度；
保证工艺液体在设定温度下反应，避免过度或不足清洗。
英文资料：
The Tokyo Electron 3397-2200047-2X chiller unit is a thermal management subsystem specifically designed for TEL semiconductor manufacturing equipment. It is primarily used to control the temperature of critical components in process equipment, ensuring their operation in high-precision and high stability environments. This component is typically integrated into high vacuum, high-temperature process platforms such as etching, deposition, and photolithography.
1、 Product Function Overview
Equipment type: chiller component (liquid cooling circulation unit)
Main functions:
Provide stable coolant temperature for the equipment;
Adjust the operating temperature of the cavity, heating plate, RF power supply, or laser light source;
Integrate with the main control system to achieve dynamic temperature control and abnormal alarm.
2、 Core application areas
1. Plasma Etcher
Cooling reaction chamber, substrate platform, and RF matching network;
Reduce the temperature of the cavity wall, suppress particle generation, and improve etching uniformity and yield.
2. CVD/ALD deposition equipment
Thermal management system for controlling deposition chambers, substrates, pipelines, etc;
Prevent material crystallization or uneven deposition, and improve film thickness consistency.
3. Photolithography system
Stable operating temperature of light source modules (such as lasers and LEDs);
Support thermal compensation and heat dissipation for exposure platforms and lens components.
4. Developing/cleaning equipment
Control the temperature of chemical liquids (such as developer, adhesive remover) or cleaning chambers;
Ensure that the process liquid reacts at the set temperature and avoid excessive or insufficient cleaning.
2.产 品 展 示
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