TEL Tokyo Electron 3Z81-000011-V2分析板 PDF资料
1.产 品 资 料 介 绍：
中文资料：
TEL Tokyo Electron 3Z81-000011-V2 分析板（Analysis Board） 是TEL半导体设备中用于信号分析、数据采集与处理的关键功能模块，通常用于检测工艺参数、监控设备状态或进行系统诊断。
一、基本信息
产品名称：分析板 / 信号分析模块
产品型号：3Z81-000011-V2
制造商：Tokyo Electron Ltd.（TEL）
板卡类型：信号采集与分析板
应用范围：半导体制造设备中工艺参数监测、故障诊断和数据处理
二、主要功能
信号采集
采集来自传感器（压力、温度、流量、电压等）的模拟或数字信号。
对输入信号进行滤波、放大、转换，准备后续处理。
数据分析处理
实时处理采集信号，提取关键工艺参数。
进行故障检测和预警，支持设备维护。
通信接口
将分析结果传输至主控系统或上位机，实现数据共享与远程监控。
诊断与校准功能
支持系统自诊断，保障数据准确性。
支持现场校准和参数调整。
三、典型应用场景
| 应用设备类型 | 功能描述 |
|---|---|
| Etcher刻蚀设备 | 监控腔体压力、电源电流等工艺参数 |
| CVD/ALD设备 | 采集气体流量、温度分布数据 |
| 光刻/涂胶显影设备 | 监控加热器状态、电压稳定性 |
| 搬运系统 | 监测机械臂动作参数及环境状态 |
英文资料：
The TEL Tokyo Electron 3Z81-000011-V2 Analysis Board is a key functional module used for signal analysis, data acquisition, and processing in TEL semiconductor equipment. It is typically used to detect process parameters, monitor equipment status, or perform system diagnostics.
1、 Basic Information
Product Name: Analysis Board/Signal Analysis Module
Product model: 3Z81-000011-V2
Manufacturer: Tokyo Electron Ltd. (TEL)
Board type: Signal acquisition and analysis board
Application scope: Process parameter monitoring, fault diagnosis, and data processing in semiconductor manufacturing equipment
2、 Main functions
signal acquisition
Collect analog or digital signals from sensors (pressure, temperature, flow rate, voltage, etc.).
Filter, amplify, and convert the input signal in preparation for subsequent processing.
Data analysis and processing
Real time processing of collected signals and extraction of key process parameters.
Perform fault detection and warning, and support equipment maintenance.
communication interface
Transfer the analysis results to the main control system or upper computer to achieve data sharing and remote monitoring.
Diagnostic and calibration functions
Support system self diagnosis to ensure data accuracy.
Support on-site calibration and parameter adjustment.
3、 Typical application scenarios
Application Device Type Function Description
Etcher etching equipment monitors process parameters such as chamber pressure and power supply current
CVD/ALD equipment collects gas flow rate and temperature distribution data
Photolithography/coating development equipment monitors heater status and voltage stability
Monitoring the motion parameters and environmental status of the robotic arm in the handling system
2.产 品 展 示
3.其他产品
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