KLA Tencor 720-24399-001扫描仪模块 PDF资料
1.产 品 资 料 介 绍：
中文资料：
KLA Tencor 720-24399-001 扫描仪模块（Scanner Module） 是用于 KLA Tencor 高精度半导体检测系统中的核心扫描控制部件，主要用于驱动并控制光学系统或检测平台在纳米/微米级别进行高精度扫描。它在晶圆检测、缺陷分析、表面轮廓测量等应用中发挥着关键作用。
一、产品基本信息
产品型号：720-24399-001
模块名称：扫描仪模块（Scanner Module）
制造商：KLA Tencor
主要功能：控制扫描平台或光学元件沿预定轨迹高速、精密移动，实现图像或数据的连续采集
二、核心功能
| 功能项 | 描述 |
|---|---|
| 扫描控制 | 控制平台或光束在X/Y/Z轴或角度方向的连续运动，实现线性或矩阵式扫描路径。 |
| 与图像采集同步 | 与图像板或传感器实时联动，保证采集与位移同步，提升图像准确性。 |
| 精密定位反馈 | 集成位置传感器反馈（如激光干涉仪、编码器），确保扫描位置误差极小。 |
| 多种扫描模式 | 支持点扫描、线扫描、区域扫描等模式，可适应不同检测需求。 |
| 高动态响应 | 优化扫描速度与加速度，提高系统整体检测效率。 |
三、应用领域
晶圆表面缺陷检测（Defect Inspection）
控制光学系统或平台扫描晶圆表面，配合图像处理系统进行缺陷识别。光学量测（Metrology）
在厚度测量、边缘检测、CD量测等任务中提供高稳定扫描控制。激光扫描系统
用于激光聚焦系统中光束或样品台的精密扫描。图像拼接与微距定位
用于连续图像获取或高分辨率图像拼接，提高检测覆盖率。
英文资料：
The KLA Tencor 720-24399-001 Scanner Module is the core scanning control component used in the KLA Tencor high-precision semiconductor detection system. It is mainly used to drive and control the optical system or detection platform to perform high-precision scanning at the nanometer/micrometer level. It plays a crucial role in applications such as wafer inspection, defect analysis, and surface contour measurement.
1、 Basic Product Information
Product model: 720-24399-001
Module Name: Scanner Module
Manufacturer: KLA Tencor
Main function: Control the scanning platform or optical components to move at high speed and precision along a predetermined trajectory, achieving continuous acquisition of images or data
2、 Core functions
Function item description
Continuous motion of the scanning control platform or beam in the X/Y/Z axis or angular direction to achieve linear or matrix scanning paths.
Synchronize with image acquisition and real-time linkage with image boards or sensors to ensure synchronization between acquisition and displacement, and improve image accuracy.
Precision positioning feedback integrates position sensor feedback (such as laser interferometers, encoders) to ensure minimal scanning position errors.
Multiple scanning modes are supported, including point scanning, line scanning, and area scanning, to meet different detection needs.
Optimize scanning speed and acceleration with high dynamic response to improve the overall detection efficiency of the system.
3、 Application Fields
Defect Inspection of Wafer Surface
Control the optical system or platform to scan the wafer surface and cooperate with the image processing system for defect recognition.
Optical Metrology
Provide high stability scanning control in tasks such as thickness measurement, edge detection, and CD measurement.
Laser scanning system
Used for precise scanning of beams or sample stages in laser focusing systems.
Image stitching and macro positioning
Used for continuous image acquisition or high-resolution image stitching to improve detection coverage.
2.产 品 展 示
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